Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-11-27

2010-12-14

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

C355S055000

Reexamination Certificate

active

07852458

ABSTRACT:
An exposure apparatus includes a projection optical system for projecting light from a reticle onto a substrate, and exposes a shot region of the substrate to radiant energy via the reticle and the projection optical system. The exposure apparatus comprises a substrate stage configured to hold the substrate and to be moved, a console configured to set a valid area inside the shot region, a measuring device configured to measure a position of a surface of the substrate in a direction parallel to an optical axis of the projection optical system, and a controller configured to control a position of the substrate stage based on the position of the surface measured by the measuring device at a measurement point in the valid area set by the console, the measurement point being determined in accordance with a position of the substrate relative to the measuring device.

REFERENCES:
patent: 6115107 (2000-09-01), Nishi
patent: 6304317 (2001-10-01), Taniguchi et al.
patent: 6538723 (2003-03-01), Hagiwara et al.
patent: 7257453 (2007-08-01), Kemmoku
patent: 10-116877 (1998-05-01), None

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