Exposure apparatus

Details Exposure apparatus Exposure apparatus

2006-10-10

2010-06-22

Kim, Peter B (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S072000

Reexamination Certificate

active

07742147

ABSTRACT:
An exposure apparatus for measuring a position of a stage, configured to hold a substrate, using a laser interferometer, and exposing the substrate through an original, and an optical element opposite to the substrate with a gap between the optical element and the substrate filled with liquid. A first supply nozzle is arranged around the optical element, which supplies the liquid to the gap, a first recovery nozzle arranged around the first supply nozzle recovers the liquid from the gap, a second supply nozzle supplies a gas outside the first recovery nozzle, a controller controls an amount of the liquid supplied from the first supply nozzle and an amount of the liquid and gas recovered from the first recovery nozzle, and a wall portion is arranged around the optical element and substantially parallel to a surface of the substrate. If Q1is the amount of the liquid supplied from the first supply nozzle and Q2is a sum of the amount of the liquid and gas recovered from the first recovery nozzle, a relationship Q1<Q2is satisfied.

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English translation of Japanese Office Action dated Oct. 1, 2007, issued in corresponding Japanese patent application No. 2005-296956.

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