Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-07-02

2009-10-13

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

07602474

ABSTRACT:
An exposure apparatus which exposes a substrate to light. An illumination optical system illuminates a mask with illumination light, and a projection optical system projects a pattern of the mask onto the substrate. The illumination light contains a primary component of polarized light and a secondary component of the polarized light, which are perpendicular to each other, and the illumination optical system includes a phase difference adjusting unit configured to adjust a phase difference between the primary component of the polarized light and the secondary component of the polarized light, without changing a direction of the primary component of the polarized light.

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patent: 6803991 (2004-10-01), Mori
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patent: 2003-133216 (2003-05-01), None
patent: 2003-297729 (2003-10-01), None
patent: WO 2004/051717 (2004-06-01), None
Born, et al., “Principles of Optics 7th”, (Cambridge), pp. 31-33.

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