Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-08-07

2008-12-23

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000, C378S034000

Reexamination Certificate

active

07468781

ABSTRACT:
An exposure apparatus includes an illumination optical system that includes an optical integrator for forming a secondary light source from the light, and a variable stop arranged at or near a position where the secondary light source is formed, the diameter variable stop that defines a NA of the illumination optical system, a projection optical system that includes an aperture stop arranged at a position substantially optically conjugate with the variable stop, the aperture stop defining a numerical aperture of the projection optical system, and a controller for controlling the aperture diameter of the variable stop as the aperture diameter varies so that an image of the secondary light source can fall within the aperture diameter of the aperture stop.

REFERENCES:
patent: 5245384 (1993-09-01), Mori
patent: 5363172 (1994-11-01), Tokuda
patent: 6717651 (2004-04-01), Kato et al.
patent: 2004/0125459 (2004-07-01), Tanitsu et al.
patent: 2006/0285100 (2006-12-01), Hamatani et al.
patent: 05299321 (1993-11-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4040729