Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-07-19

2008-10-28

Nguyen, Hung Henry (Department: 2851)

Photocopying

Contact printing

Exposing on sensitized printing press plate or cylinder

C355S053000

Reexamination Certificate

active

07443487

ABSTRACT:
The exposure apparatus includes: a light source which emits parallel light having a wavelength used for exposure; a photomask which includes a substrate, an optical shielding layer and an optical selective layer, the substrate being capable of transmitting the light of the wavelength, the optical shielding layer being made of a material not transmitting the light of the wavelength, the optical selective layer selectively transmitting light in accordance with a shape to be formed by the exposure, the optical shielding layer and the optical selective layer being arranged on a first side of the substrate; a photomask stage which holds the photomask of which the first side has been coated with photosensitive material, in such a manner that the light emitted from the light source falls on a second side of the photomask reverse to the first side and is projected to the photosensitive material on the first side; a photomask rotation device which rotates the photomask stage on an axis perpendicular to the second side of the photomask; and a photomask tilt device which is capable of tilting the photomask held on the photomask stage in such a manner that the light emitted from the light source falls perpendicularly and obliquely on the second side of the photomask.

REFERENCES:
patent: 4264714 (1981-04-01), Trausch
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 6819401 (2004-11-01), Tsujikawa et al.
patent: 55-7799 (1980-01-01), None
patent: 57-153433 (1982-09-01), None
patent: 2005-173129 (2005-06-01), None

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