Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-03-16

2008-08-05

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07408620

ABSTRACT:
An exposure apparatus includes a illumination optical system for illuminating a reticle with light from a light source, and a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to the object, wherein a surface on the object side of the lens is smaller than an effective area of a surface on the reticle side of the lens, and wherein said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object.

REFERENCES:
patent: 6878916 (2005-04-01), Schuster
patent: 7088422 (2006-08-01), Hakey et al.
patent: 2004/0263809 (2004-12-01), Nakano
patent: 2005/0094119 (2005-05-01), Loopstra et al.
patent: 2005/0225737 (2005-10-01), Weissenrieder et al.
patent: WO9949504 (1999-09-01), None
patent: 2005-19864 (2005-01-01), None
patent: 99/49504 (1999-09-01), None
English translation of WO9949504, dated Nov. 13, 2007.

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