Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-05-22

2007-05-22

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

11173417

ABSTRACT:
An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto an object using a light with wavelength of 20 nm or less from a light source, and first and second accommodating parts for accommodating the projection optical system and the mask or the object, said first and second accommodating part has different pressures, wherein said a Ps/Po≧100 and Ps≦10−3Pa are met, where Po is the pressure of the first accommodating part, and Ps is the pressure of the second accommodating part.

REFERENCES:
patent: 6333775 (2001-12-01), Haney et al.
patent: 6842221 (2005-01-01), Shiraishi
patent: 7110088 (2006-09-01), Tominaga
patent: 2691865 (1997-09-01), None
patent: 2003-332214 (2003-11-01), None
patent: 200333214 (2003-11-01), None
English Abstract for Japanese Patent Application 2691865.
English Abstract for Japanese Patent Application 2003-332214.

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3820694