Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-05-01

2007-05-01

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C327S055000, C327S059000

Reexamination Certificate

active

11042195

ABSTRACT:
An exposure apparatus including a pulse light source, an exposure unit which exposes a substrate to a pattern with light from the pulse light source, a determination unit which determines necessity of maintenance for the pulse light source based on a pulse rate of the pulse light source within a predetermined period of time, and a decision unit which decides a timing of the maintenance based on a determination result of the determination unit.

REFERENCES:
patent: 5097291 (1992-03-01), Suzuki
patent: 5250797 (1993-10-01), Sano et al.
patent: 5646954 (1997-07-01), Das et al.
patent: 6219367 (2001-04-01), Atsumi
patent: 2005/0141903 (2005-06-01), Kwon
patent: 04252013 (1992-09-01), None
patent: 5-62876 (1993-03-01), None
patent: 8-167562 (1996-06-01), None

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