Exposure apparatus

Details Exposure apparatus Exposure apparatus

2006-10-31

2006-10-31

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

Reexamination Certificate

active

07130024

ABSTRACT:
An exposure apparatus includes an illumination optical system for illuminating an reticle using light from a light source, a projection optical system for projecting a pattern of the reticle onto a substrate, and a variable stop having an opening for regulating an illumination area on the substrate, said variable stop is arranged near a position conjugate with the substrate, wherein a position of the variable stop is variable along an optical axis of the illumination optical system or an optical axis of the projection optical system.

REFERENCES:
patent: 4589769 (1986-05-01), Matsuki
patent: 4937618 (1990-06-01), Ayata et al.
patent: 2002/0109827 (2002-08-01), Nishi
patent: 60-45252 (1985-03-01), None
patent: 60-158449 (1985-08-01), None
patent: 7-37774 (1995-02-01), None
patent: 2000-114164 (2000-04-01), None

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