Exposure apparatus

Details Exposure apparatus Exposure apparatus

2006-11-28

2006-11-28

Tran, Huan (Department: 2861)

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

C347S237000

Reexamination Certificate

active

07142229

ABSTRACT:
An exposure apparatus includes a light emitting device array in which a plurality of light emitting devices comprising light emitting sections formed onto a transparent substrate with a predetermined pattern and capable of being controlled and driven independently are arranged in a primary scanning direction to form a device row and a plurality of the device rows are arranged in a secondary scanning direction intersecting with the primary scanning direction. Further, the plurality of light emitting devices are aligned in the secondary direction with respect to a photosensitive material, and the plurality of device rows are sequentially illuminated on a time-division basis. In particular, the plurality of device rows are arranged with a pitch T expressed by T=(m−1
)P when they are sequentially illuminated in a direction identical to the secondary scanning direction, and are arranged with a pitch T expressed by T=(m+1
)P when they are sequentially illuminated in a direction opposite to the secondary scanning direction, where P is the pitch of an exposure pixel, m is an integer equal to or greater than 2, and n is the number of device rows arranged in the secondary scanning direction.

REFERENCES:
patent: 6538682 (2003-03-01), Ohkubo
patent: 6731322 (2004-05-01), Hori
patent: 6781617 (2004-08-01), Ohkubo
patent: 6816181 (2004-11-01), Ohkubo
patent: 2002/0085187 (2002-07-01), Ohkubo
patent: 2004/0146969 (2004-07-01), Furutani et al.
patent: 2004/0233271 (2004-11-01), Nojima et al.
patent: 2005/0007441 (2005-01-01), Hyuga
patent: 03-110513 (1991-05-01), None
patent: 2001-356422 (2001-12-01), None

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