Exposure apparatus

Details Exposure apparatus Exposure apparatus

1996-07-18

1999-05-25

Lee, Eddie C.

Photocopying

Projection printing and copying cameras

Step and repeat

250548, G03B 2742, G01N 2186

Patent

active

059073926

ABSTRACT:
A scanning type exposure apparatus includes a mask stage position-measuring unite a substrate stage position-measuring unit, an arithmetic processing unit, and a control unit. The arithmetic processing unit multiplies results of measurement (WX, WY, W.theta.) by the substrate position-measuring unit by a conversion vector including components containing a magnification of a projection optical system and an angle of rotation between a mask and a substrate to determine a target vector quantity (RX*, RY*, R.theta.*) of a mask stage. An error vector is determined by subtracting, from the target vector quantity, results of measurement (RX, RY, R.theta.) by the mask stage position-measuring unit. The controller controls the mask stage so that the error vector becomes zero. The exposure apparatus includes correcting sections for correcting time lags in measurement by the respective position-measuring units. The arithmetic processing unit uses corrected positional information. The mask stage can accurately follow a substrate stage.

REFERENCES:
patent: 5477304 (1995-12-01), Nishi
patent: 5483311 (1996-01-01), Sakakibara et al.
patent: 5506684 (1996-04-01), Ota et al.
patent: 5646413 (1997-07-01), Nishi
patent: 5699145 (1997-12-01), Makinouchi et al.
"Expanding the Horizons of Optical Projection Lithography", Jere D. Buckley, Solid State Technology, May 1982, pp. 77-82.

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