Exposure apparatus

Details Exposure apparatus Exposure apparatus

2006-03-07

2006-03-07

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000, C355S075000, C250S492200

Reexamination Certificate

active

07009683

ABSTRACT:
Two independent fine adjustment stages are arranged on one coarse adjustment stage to simultaneously perform all of focus measurement and part of alignment measurement in parallel with an exposure operation. A method of transporting a wafer together with a chuck is adopted as a precondition. Alignment of a pattern on a wafer with a chuck is performed before the chuck is mounted on each fine adjustment stage.

REFERENCES:
patent: 4496239 (1985-01-01), Isohata et al.
patent: 4659227 (1987-04-01), Sato et al.
patent: 4747608 (1988-05-01), Sato et al.
patent: 4870288 (1989-09-01), Abuku et al.
patent: 5270771 (1993-12-01), Sato
patent: 5499099 (1996-03-01), Sato et al.
patent: 5504407 (1996-04-01), Wakui et al.
patent: 5511930 (1996-04-01), Sato et al.
patent: 5585925 (1996-12-01), Sato et al.
patent: 5608492 (1997-03-01), Sato
patent: 5715064 (1998-02-01), Lin
patent: 5753926 (1998-05-01), Sato
patent: 5757149 (1998-05-01), Sato et al.
patent: 5993081 (1999-11-01), Itoh et al.
patent: 6341007 (2002-01-01), Nishi et al.
patent: 6400441 (2002-06-01), Nishi et al.
patent: 6437463 (2002-08-01), Hazelton et al.
patent: 6549269 (2003-04-01), Nishi et al.
patent: 6590634 (2003-07-01), Nishi et al.
patent: 6590636 (2003-07-01), Nishi
patent: 2003/0002021 (2003-01-01), Sato
patent: 2004/0032575 (2004-02-01), Nishi et al.
patent: 2005/0005702 (2005-01-01), Osuga
patent: 10-163098 (1998-06-01), None
patent: 3045947 (2000-03-01), None
patent: WO 98/28665 (1998-07-01), None

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