Exposure apparatus

Details Exposure apparatus Exposure apparatus

2006-09-05

2006-09-05

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C430S005000

Reexamination Certificate

active

07102734

ABSTRACT:
An exposure apparatus for exposing a mask pattern onto an object by using a light with wavelength of approximately 11 nm, said exposure apparatus including a projection optical system that includes a reflection-type optical element that has a multilayer film including a Be layer, and a reflection-type mask including a multilayer film that includes a first layer that has a first refractive index, and a second layer that has a second refractive index that has a real part that is larger than a real part of the first refractive index, said reflection-type mask includes the mask pattern, wherein said the first layer includes a beryllium, chrome, cobalt, niobium, molybdenum, technetium, ruthenium, rhodium, palladium, or tungsten, wherein said the second layer includes a lithium, boron, carbon, nitrogen, oxygen, fluorine, silicon, aluminum, titanium, scandium, iron, germanium, lanthanum, magnesium, tungsten, strontium, yttrium, or zirconium.

REFERENCES:
patent: 5052033 (1991-09-01), Ikeda et al.
patent: 6228512 (2001-05-01), Bajt et al.
patent: 6333961 (2001-12-01), Murakami
patent: 6985211 (2006-01-01), Singh et al.
patent: 2003/0147058 (2003-08-01), Murakami et al.
patent: 1-175736 (1989-07-01), None

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