Exposure apparatus

Details Exposure apparatus Exposure apparatus

2005-08-02

2005-08-02

Lu, Jiping (Department: 3749)

Drying and gas or vapor contact with solids

Apparatus

Houses, kilns, and containers

C034S212000, C034S215000

Reexamination Certificate

active

06922910

ABSTRACT:
An exposure apparatus is provided for performing exposure processes with high accuracy by accurately performing pressure control inside a chamber having a plurality of air-conditioning chambers. The inside of the main chamber which accommodates the exposure apparatus is divided into a plurality of air-conditioning chambers, and a pressure detection device which detects the pressure is provided with each of the plurality of air-conditioning chambers. Also, among the plurality of the air-conditioning chambers, the pressure inside a main column which accommodates an exposure stage on which a wafer in mounted and subjected to an exposure process, is set to be higher than the pressure of the other air-conditioning chambers based on detection results obtained from the pressure detection devices.

REFERENCES:
patent: 4786947 (1988-11-01), Kosugi et al.
patent: 6297871 (2001-10-01), Hagiwara
patent: 2003/0038929 (2003-02-01), Tokuda et al.
patent: 199 32 735 (2000-10-01), None
patent: A 62-69617 (1987-03-01), None
patent: A 62-181426 (1987-08-01), None
patent: A 2-77809 (1990-03-01), None
patent: A 2000-299265 (2000-10-01), None
patent: A 2001-44112 (2001-02-01), None
patent: A 2001-345248 (2001-12-01), None
patent: 2000-0065440 (2000-11-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3523876