Exposure apparatus

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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Details

C700S301000

Reexamination Certificate

active

06853871

ABSTRACT:
This invention is to sufficiently reduce a change in optical characteristic of an optical system due to gas mixture in each space in the optical system and to resolve a pattern image with a small line width. A projection optical system (22) has lenses (2a-2c) as a plurality of optical elements, a holding member (3) for holding the lenses, and a lens barrel (1) serving as a vessel for accommodating the lenses (2a-2c) and holding member (3). The lens barrel (1) has at least two spaces (51a, 51b) inside. A gas contained in one space (51a) has a refractive index different from that of a gas contained in the other space (51b). The pressure of the gas in one space (51a) is different from that of the gas in the other space51b. The vessel (1) has gas supply ports (5a, 5c) for independently supplying the gases into the two spaces (51a, 51b) and gas exhaust ports (5b, 5d) for exhausting the gases.

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patent: 5-210049 (1993-08-01), None
patent: 11-297620 (1999-10-01), None
patent: 2000-56197 (2000-02-01), None

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