Exposure apparatus

Details Exposure apparatus Exposure apparatus

2005-11-08

2005-11-08

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

C438S378000, C438S551000, C438S795000, C438S947000, C355S030000

Reexamination Certificate

active

06962825

ABSTRACT:
Disclosed is an exposure apparatus for printing, by exposure, a pattern of an original on a substrate, which includes a housing tightly filled with a predetermined ambience and for accommodating therein at least a portion of an exposure light optical axis, and a detection system having an optical system, wherein a portion of a light path of the detection system is disposed in a first space enclosed by the housing, and wherein at least another portion of the detection system including an electric element thereof is disposed in a second space outside the housing.

REFERENCES:
patent: 5137349 (1992-08-01), Taniguchi et al.
patent: 5227862 (1993-07-01), Oshida et al.
patent: 5559584 (1996-09-01), Miyaji et al.
patent: 5859707 (1999-01-01), Nakagawa et al.
patent: 6330065 (2001-12-01), Hill
patent: 6341006 (2002-01-01), Murayama et al.
patent: 6451507 (2002-09-01), Suenaga et al.
patent: 6496257 (2002-12-01), Taniguchi et al.
patent: 6507388 (2003-01-01), Burghoorn
patent: 6522384 (2003-02-01), Miwa
patent: 2001/0010579 (2001-08-01), Nishi
patent: 2003/0095241 (2003-05-01), Burghoorn
patent: 7-29812 (1995-01-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3499364