Exposure apparatus

Details Exposure apparatus Exposure apparatus

2005-05-24

2005-05-24

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000, C355S075000

Reexamination Certificate

active

06897939

ABSTRACT:
An exposure apparatus for exposing a substrate in a vacuum atmosphere includes vibration absorbing mounts that are disposed in a vacuum chamber in order to make it possible to support at least one exposure structure in the vacuum atmosphere with high precision. The at least one exposure structure includes at least one of a mask stage plate, a wafer stage plate, and a barrel surface plate. The vibration absorbing mounts are formed using metallic bellows. By the vibration absorbing mounts, the at least one exposure structure is supported in the vacuum chamber.

REFERENCES:
patent: 5881987 (1999-03-01), Hara
patent: 6014421 (2000-01-01), Chiba et al.
patent: 6323494 (2001-11-01), Lee
patent: 6493062 (2002-12-01), Tokuda et al.
patent: 6496248 (2002-12-01), Tanaka
patent: 20020159042 (2002-10-01), Poon
patent: 20030137643 (2003-07-01), Jacobs et al.
patent: 6066346 (1994-08-01), None
patent: 9-298142 (1997-11-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3456749