Exposure apparatus

Details Exposure apparatus Exposure apparatus

1986-03-05

1987-12-08

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

G03B 2774, G03B 2780

Patent

active

047115688

ABSTRACT:
An exposure apparatus and method for irradiating a mask having a circuit pattern with light emitted from an intermittently emitting type light source so that the mask pattern is photolithographically transferred onto a semiconductor wafer, wherein the output of the intermittent-emission type light source is detected prior to the photolithographic transfer of the mask pattern onto the wafer and, in accordance with the result of such detection, the amount of exposure of the wafer to the light beam from the mask is controlled.

REFERENCES:
patent: 4541715 (1985-09-01), Akiyama et al.

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