Exposure and method which tests optical characteristics of optic

Photocopying – Projection printing and copying cameras – Illumination systems or details

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355 53, 355 55, 355 68, 356399, 356400, 356401, G03B 2754, G03B 2742, G03B 2752, G01B 1100

Patent

active

057742057

ABSTRACT:
An exposure apparatus for and a method of producing devices, in which an original pattern such as a reticle is projected onto an object such as a wafer to be exposed, through a projection optical system. The projection optical system includes at least one optical element, optical characteristics thereof having been tested using a measuring beam having a first wavelength region. An exposure light source emits a light beam having a second wavelength region, selected independently from the first wavelength region, to irradiate the original pattern with the beam from the exposure light source, so that an image of the pattern is projected onto the object through the projection optical system, thereby exposing the object to produce the device.

REFERENCES:
patent: 4629313 (1986-12-01), Tanimoto
patent: 4938598 (1990-07-01), Akiyama et al.
patent: 5138176 (1992-08-01), Nishi
patent: 5381210 (1995-01-01), Hagiwara
patent: 5534970 (1996-07-01), Nakashima et al.
patent: 5614990 (1997-03-01), Bruce et al.

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