Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1998-09-04
1999-11-02
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
G03F 900
Patent
active
059767383
ABSTRACT:
An exposure method comprises a first exposure step of using a first exposure apparatus having a first exposure field and projecting a pattern of a first mask onto a photosensitive substrate to effect exposures according to a first shot map where an exposure region on the photosensitive substrate is divided in units of first shot areas each corresponding to the first exposure field; and a second exposure step of using a second exposure apparatus having a second exposure field larger than the first exposure field and projecting a pattern of a second mask onto the photosensitive substrate to effect exposures according to a second shot map arranged so that a number of shots therein becomes minimum when a region including the first shot map is divided in units of second shot areas each corresponding to the second exposure field.
Also, an apparatus having a first exposure field, a second exposure apparatus having a second exposure field larger than the first exposure field, a first shot map forming device provided in the first exposure apparatus, a control unit for transferring information on the first shot map to the second exposure apparatus, and a second shot map forming device provided in the second exposure apparatus, for forming a second shot map, based on the information on the first shot map, so that a number of shots becomes minimum.
REFERENCES:
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4734746 (1988-03-01), Ushida et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5407763 (1995-04-01), Pai
Nikon Corporation
Young Christopher G.
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