Exposing method, exposing apparatus and device manufacturing...

Details Exposing method, exposing apparatus and device manufacturing... Exposing method, exposing apparatus and device manufacturing...

2007-07-31

2007-07-31

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S077000

Reexamination Certificate

active

10998905

ABSTRACT:
An exposing method which can effect the cleaning of an optical element so that throughput may not be substantially reduced when exposure using ultraviolet light is effected. The exposing method applies ultraviolet light emitted from a light source to an object to be exposed through a first isolated chamber including an optical surface, and a second isolated chamber including an optical surface to thereby expose the object to be exposed by the light. The method includes a first cleaning step of supplying a cleaning gas to the first isolated chamber to thereby clean the optical surface included in the first isolated chamber, and a second cleaning step of supplying a cleaning gas to the second isolated chamber to thereby clean the optical surface included in the second isolated chamber, wherein the start of the first cleaning step is later than the start of the second cleaning step.

REFERENCES:
patent: 6252648 (2001-06-01), Hase et al.
patent: 6571057 (2003-05-01), Aoki
patent: 2000-082856 (2000-03-01), None
patent: 2000-126704 (2000-05-01), None
patent: 2001-274070 (2001-10-01), None
patent: 2001-296417 (2001-10-01), None
patent: 2003-344601 (2003-12-01), None

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