Exposing method

Details Exposing method Exposing method

2005-01-11

2005-01-11

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Methods

C355S052000, C355S053000

Reexamination Certificate

active

06842230

ABSTRACT:
Lens distortion correction is characterized by obtaining a correction parameter by using the difference between the latest QC data used when exposing a overlaying layer and the latest QC data used when exposing a overlaid layer.

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van den Brink, M. A. et al., Matching Management of Multiple Wafer Steppers Using A Stable Standard and A Matching Simulator, Integrated Circuit Metrology, Inspection, and Process Control III, (1989), SPIE vol. 1087, pps. 218-232.

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