Exposing apparatus having substrate chuck of good flatness

Details Exposing apparatus having substrate chuck of good flatness Exposing apparatus having substrate chuck of good flatness

2011-03-29

2011-03-29

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S053000

Reexamination Certificate

active

07916277

ABSTRACT:
An exposing apparatus maintains uniformly a gap between a substrate and a mask stage. The substrate is disposed on a substrate chuck and the substrate chuck is supported by gap motors and air cylinders. The gap motors control the gap between the substrate and the mask stage and the air cylinders support the deflect portion of the substrate chuck to maintain the flatness of the whole area of the substrate.

REFERENCES:
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First Office Action issued in corresponding Chinese Patent Application No. 2006100834884; issued Mar. 28, 2008.
Office Action issued in corresponding Taiwanese Patent Application No. 95118780; issued Jul. 30, 2009.
Office Action issued in corresponding Japanese Patent Application No. 2006-149760; mailed Jul. 15, 2009.

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