Exposing apparatus and exposing method, for maskless...

Details Exposing apparatus and exposing method, for maskless... Exposing apparatus and exposing method, for maskless...

2004-03-26

2008-10-28

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S022000, C430S394000, C430S396000, C430S397000

Reexamination Certificate

active

07442477

ABSTRACT:
An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to form a desired exposure pattern using the light sources comprises a control means for controlling the turning-on of only specific light sources out of the two or more light sources at a specific timing.

REFERENCES:
patent: 7094506 (2006-08-01), Van Buel
patent: 10-112579 (1998-04-01), None
patent: 2001-174721 (2001-06-01), None

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