Exit window for X-ray lithography beamline

Details Exit window for X-ray lithography beamline Exit window for X-ray lithography beamline

1994-12-15

1996-06-04

Porta, David P.

X-ray or gamma ray systems or devices

Beam control

Window

378 34, G21K 100

Patent

active

055240429

ABSTRACT:
An exit window for an X-ray lithography beamline having a shape and thickness such that the exit window can withstand a pressure differential of at least 14.7 psi and allows an X-ray beam as passed through the window to have X-rays above and below a desired energy band substantially attenuated. The exit window includes a thin material having a window section disposed within an opening of a frame and a peripheral section which is integral with the window section and extends within the frame. The window section has a shape that is substantially concave along its width, substantially linear along its length and tapers to a flat surface near the periphery of the opening. A method of scanning the X-ray beam through a stationary exit window and onto an exposure field on a wafer is also disclosed.

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"Webster's New World Dictionary", pp. 86-87.
Brodsky (1988) "The Mechanical Design of Thin Beryllium Windows for Synchrotron Radiation," Nuclear Instruments and Methods in Physics Research A266:358-361.
Kovacs, et al. (1990) "Optimizing a synchrotron based X-ray lithography system for IC manufacturing," SPIE 1263:140-150, 7-8 Mar. 1990.
Kovacs, et al. (1991) "System design considerations for a production grade ESR-based X-ray lithography beamline," SPIE 1465:88-99, 6-7 Mar. 1991.

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