Exhaust vent assembly for chemical vapor deposition systems

Coating apparatus – Gas or vapor deposition

Patent

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Details

118725, 118729, C23C 1600

Patent

active

059388510

ABSTRACT:
A vent assembly for a chemical vapor deposition system which includes an injector which injects gaseous substances into a reaction chamber for depositing a film on a substrate positioned in the chamber. The vent assembly includes at least one vent having an inlet, an outlet spaced from the inlet and oriented such that the plane of the outlet intersects the inlet, and a passageway joining the inlet and the outlet. The passageway has a linear first stretch substantially axially aligned with the inlet and having a substantially uniform cross-sectional area along the length thereof. The passageway has a nonlinear second stretch joining the first stretch to the outlet. The second stretch is shaped so that changes in direction of the gas flow through the vent are removed from the region of the passageway which is substantially axially aligned with the inlet.

REFERENCES:
patent: 4446815 (1984-05-01), Kalbskopf
patent: 4834020 (1989-05-01), Bartholomew
patent: 5413671 (1995-05-01), Ketchum
patent: 5487784 (1996-01-01), Ellis

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