Coating apparatus – Gas or vapor deposition
Patent
1997-04-14
1999-08-17
Bueker, Richard
Coating apparatus
Gas or vapor deposition
118725, 118729, C23C 1600
Patent
active
059388510
ABSTRACT:
A vent assembly for a chemical vapor deposition system which includes an injector which injects gaseous substances into a reaction chamber for depositing a film on a substrate positioned in the chamber. The vent assembly includes at least one vent having an inlet, an outlet spaced from the inlet and oriented such that the plane of the outlet intersects the inlet, and a passageway joining the inlet and the outlet. The passageway has a linear first stretch substantially axially aligned with the inlet and having a substantially uniform cross-sectional area along the length thereof. The passageway has a nonlinear second stretch joining the first stretch to the outlet. The second stretch is shaped so that changes in direction of the gas flow through the vent are removed from the region of the passageway which is substantially axially aligned with the inlet.
REFERENCES:
patent: 4446815 (1984-05-01), Kalbskopf
patent: 4834020 (1989-05-01), Bartholomew
patent: 5413671 (1995-05-01), Ketchum
patent: 5487784 (1996-01-01), Ellis
Bueker Richard
WJ Semiconductor Equipment Group, Inc.
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