Exhaust system for high temperature furnace

Details Exhaust system for high temperature furnace Exhaust system for high temperature furnace

1996-08-26

1998-05-19

Joyce, Harold

Heating

Work feeding, agitating, discharging or conveying...

Removable furnace bottom section or kiln cart

432 5, 432 6, 432156, 432253, F27D 312

Patent

active

057528195

ABSTRACT:
An exhaust system for use with a high temperature furnace used to perform oxidation and/or annealing operations of the type used in semiconductor fabrication. The exhaust system is designed to permit the furnace to be used with a controlled environment chamber surrounding the entry to the process chamber of the furnace. The exhaust system allows a relatively high velocity flow of exhaust gas from the process chamber through the exhaust system to occur when a positive pressure (e.g., annealing) operations are performed. Such high velocity flow prevents (a) backstreaming and (b) the accumulation of non-uniform concentrations of exhaust gases in the exhaust system, thereby permitting the accurate monitoring of the concentration of a selected gas in the exhaust system. Based on such monitoring, the opening of the door to the process chamber of the furnace may be prevented when the concentration of the selected gas exceeds a predetermined level. Preferably, all portions of the exhaust system potentially exposed to process chamber gases are made from quartz.

REFERENCES:
patent: 4195666 (1980-04-01), Goetz et al.
patent: 4943235 (1990-07-01), Nakao et al.
patent: 4976610 (1990-12-01), Yates
patent: 4992044 (1991-02-01), Philipossian
patent: 5035611 (1991-07-01), Neubecker et al.
patent: 5064367 (1991-11-01), Philipossian
patent: 5088922 (1992-02-01), Kakizaki et al.
patent: 5118286 (1992-06-01), Sanin
patent: 5174745 (1992-12-01), Kim
patent: 5378145 (1995-01-01), Ono et al.

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