Coating apparatus – Gas or vapor deposition
Patent
1998-08-17
1999-10-12
Bueker, Richard
Coating apparatus
Gas or vapor deposition
C23C 1600
Patent
active
059649488
ABSTRACT:
The exhaust insert is designed to reduce the eddy currents created within the reaction chamber so as to provide more even and predictable etching and/or epitaxial deposition. The exhaust insert is at least partially inserted into the exhaust port of the epitaxial barrel reactor. In particular, the exhaust insert includes an extension member that is adapted to be at least partially inserted within the exhaust port. The exhaust insert also includes an inlet member that extends beyond the exhaust port and into the barrel reactor. The inlet member is angled relative to the extension member so as to support the exhaust insert within the exhaust port of the barrel reactor. The angled design of the exhaust insert also serves to essentially scoop the exhaust gases into the exhaust port, thereby significantly reducing eddy current flow within the reaction chamber.
REFERENCES:
patent: 3796182 (1974-03-01), Rosler
patent: 4421786 (1983-12-01), Mahajan et al.
patent: 4976217 (1990-12-01), Frijlink
Applied Materials, Inc. Manual, Precision 7700.TM. Maintenance, Preventive Maintenance Procedures, Jul. 1994, pp. 3-27.
Anderson Mitchell Dena Carol
Dietze Gerald Roger
Bueker Richard
SEH America Inc.
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