Exhaust gas scrubber for epitaxial wafer manufacturing device

Details Exhaust gas scrubber for epitaxial wafer manufacturing device Exhaust gas scrubber for epitaxial wafer manufacturing device

2005-10-07

2009-06-30

Smith, Duane (Department: 1797)

Gas separation: apparatus

With gas and liquid contact apparatus

Diverse means for adding liquid for gas and liquid contact

C096S277000, C096S322000, C095S216000, C095S224000, C261S114100, C261S115000, C261S116000, C261S117000, C261S118000, C261SDIG054

Reexamination Certificate

active

07553356

ABSTRACT:
This exhaust gas scrubber for an epitaxial wafer manufacturing device includes: a scrubber inlet tube for introducing an exhaust gas discharged from an epitaxial wafer manufacturing device; and a wash tube unit formed inside the scrubber inlet tube for spraying wash water toward an interior of the scrubber inlet tube from one end thereof so as to wash adhesions inside the scrubber inlet tube, wherein the wash tube unit includes an outer tube through which inert gas constantly flows, a middle tube which is formed inside the outer tube and through which inert gas intermittently flows, and an inner tube which is formed inside the middle tube and through which the wash water and inert gas alternately flow.

REFERENCES:
patent: 63-1620 (1988-01-01), None
patent: 09-186093 (1997-07-01), None
patent: 2001-007034 (2001-01-01), None
patent: 11-333267 (2001-06-01), None
patent: 2001-149822 (2001-06-01), None
patent: 2003-260333 (2003-09-01), None
Japanese Office Action dated Aug. 5, 2008 for Appln. No. 2004-297531.

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