Exhaust apparatus for epitaxial growth system

Details Exhaust apparatus for epitaxial growth system Exhaust apparatus for epitaxial growth system

1992-07-30

1993-10-05

Hart, Charles

Gas separation: apparatus

Solid sorbent apparatus

Plural diverse separating means

55DIG46, 118715, B01D 5304

Patent

active

052500926

ABSTRACT:
An exhaust apparatus for an epitaxial growth system includes an exhaust pipe, a dust filter, and a liquid nitrogen trap. The exhaust pipe performs exhaustion of a reaction furnace in which a reaction gas is supplied to grow a thin film on a semiconductor wafer. The dust filter traps reaction products which have not been used for growing the thin film on the semiconductor wafer, and the dust filter is arranged in the exhaust pipe. The liquid nitrogen trap is arranged in the exhaust pipe in series with the dust filter.

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