Exhaust apparatus configured to reduce particle...

Details Exhaust apparatus configured to reduce particle... Exhaust apparatus configured to reduce particle...

2006-03-08

2010-06-22

Hassanzadeh, Parviz (Department: 1792)

Coating apparatus

Gas or vapor deposition

C118S7230ER, C118S7230AN, C118S733000, C156S345290

Reexamination Certificate

active

07740705

ABSTRACT:
A method and system for vapor deposition on a substrate that disposes a substrate in a process space of a processing system that is isolated from a transfer space of the processing system, processes the substrate at either of a first position or a second position in the process space while maintaining isolation from the transfer space, and deposits a material on said substrate at either the first position or the second position. Furthermore, the system includes a high conductance exhaust apparatus configured to be coupled to the process space, whereby particle contamination of the substrate processed in the deposition system is minimized. The exhaust apparatus comprises a pumping system located above the substrate and an evacuation duct, wherein the evacuation duct has an inlet located below the substrate plane.

REFERENCES:
patent: 4778559 (1988-10-01), McNeilly
patent: 4870923 (1989-10-01), Sugimoto
patent: 5223001 (1993-06-01), Saeki
patent: 6051371 (2000-04-01), Mita et al.
patent: 6183564 (2001-02-01), Reynolds et al.
patent: 6281141 (2001-08-01), Das et al.

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