Excitation atomic beam source

Details Excitation atomic beam source Excitation atomic beam source

1994-03-31

1996-04-09

Anderson, Bruce C.

Radiant energy

Electrically neutral molecular or atomic beam devices and...

H05H 124, H05H 300

Patent

active

055064051

ABSTRACT:
In an excitation atomic beam source for use in doping impurities to a semiconductor, a magnetic field is generated in a space between a nozzle (12) and a skimmer (13). A microwave discharge is generated in the space to form a plasma in the space by applying microwaves to a gas to be ionized emitted from the nozzle (12). In this manner, high-velocity particles and excited atoms in the plasma are passed through the skimmer (13) to thereby generate a supersonic excitation atomic beam.

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patent: 5282899 (1994-02-01), Balmashnov et al.
patent: 5286331 (1994-02-01), Chen et al.
patent: 5336533 (1994-08-01), Balmashnov
L. Valyi, "Atom and Ion Sources", A Wiley-Interscience Publication, 1977, pp. 90-97.
"Reactive Atom Radical Sources for Thin Film Processes", Oxford Applied Research.

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