X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1994-09-13
1998-09-22
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 57, G01T 136
Patent
active
058126309
ABSTRACT:
The invention relates to an examination method whereby a respective spectrum with a number of spectral values is measured for a number of locations. Collective evaluation of the old spectra is enabled by the following steps:
REFERENCES:
patent: 5467404 (1995-11-01), Vuylsteke et al.
Gianelli et al., "Multichannel Imaging Spectrophotometer for Direct Analysis of Mixtures on Thin-Layer Chromatography Plates", Analytical Chemistry, vol. 55, Oct. 1983, No. 12, pp. 1858-1862.
Kalivas, "Assessing Spectral Orthogonality", Applied Spectroscopy Reveiws, 25 (1989) Sep./Dec., Nos. 3/4, pp. 229-259.
W.H. Press et al, "Numerical Recipes, The Art of Scientifie Computing", pp. 52-65. No Date.
G.A. Golub et al, "Matrix Computations", 1983, pp. 16-21.
Barschall Anne E.
Bruce David Vernon
Porta David P.
U.S. Philips Corporation
LandOfFree
Examination method for the evaluation of location-dependent spec does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Examination method for the evaluation of location-dependent spec, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Examination method for the evaluation of location-dependent spec will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1631090