Evaporator

Coating apparatus – Gas or vapor deposition – Multizone chamber

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Details

118723, 118726, 118733, 427 38, 204192N, C23C 1312

Patent

active

045261326

ABSTRACT:
An apparatus for performing deposition on a substrate wherein the discharger is disposed in an outwardly protruding portion of the vacuum chamber. The discharger is positioned in this outwardly protruding portion so that it is isolated from the evaporation space and directed away from both the substrate and evaporation space. The discharger comprises a gas introduction tube with a discharge electrode surrounding this tube.

REFERENCES:
patent: 3847114 (1974-11-01), Kiyozumi
patent: 3980044 (1976-09-01), Zollinger
patent: 4239584 (1980-12-01), Chang et al.
patent: 4392452 (1983-07-01), Taketoshi et al.
patent: 4439463 (1984-03-01), Miller

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