Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1983-11-22
1985-07-02
Smith, John D.
Coating apparatus
Gas or vapor deposition
Multizone chamber
118723, 118726, 118733, 427 38, 204192N, C23C 1312
Patent
active
045261326
ABSTRACT:
An apparatus for performing deposition on a substrate wherein the discharger is disposed in an outwardly protruding portion of the vacuum chamber. The discharger is positioned in this outwardly protruding portion so that it is isolated from the evaporation space and directed away from both the substrate and evaporation space. The discharger comprises a gas introduction tube with a discharge electrode surrounding this tube.
REFERENCES:
patent: 3847114 (1974-11-01), Kiyozumi
patent: 3980044 (1976-09-01), Zollinger
patent: 4239584 (1980-12-01), Chang et al.
patent: 4392452 (1983-07-01), Taketoshi et al.
patent: 4439463 (1984-03-01), Miller
Konishiroku Photo Industry Co,., Ltd.
Plantz Bernard F.
Smith John D.
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