Coating processes – Spray coating utilizing flame or plasma heat
Patent
1991-03-18
1994-10-18
Owens, Terry J.
Coating processes
Spray coating utilizing flame or plasma heat
427250, 4272551, 4272552, 4272555, 118718, 118723ME, 118723MP, 118726, 118729, 118730, C23C 1650
Patent
active
053566734
ABSTRACT:
A method and apparatus for depositing thin films of materials such as metals, oxides and nitrides at low temperature relies on a supersonic free jet of inert carrier gas to transport vapor species generated from an evaporation source to the surface of a substrate. Film deposition vapors are generated from solid film precursor materials, including those in the form of wires or powders. The vapor from these sources is carried downstream in a low pressure supersonic jet of inert gas to the surface of a substrate where the vapors deposit to form a thin film. A reactant gas can be introduced into the gas jet to form a reaction product with the evaporated material. The substrate can be moved from the gas jet past a gas jet containing a reactant gas in which a discharge has been generated, the speed of movement being sufficient to form a thin film which is chemically composed of the evaporated material and reactant gases.
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High Quality MNS Capacitors Prepared By Jet Vapor Deposition At Room Temperature by D. Wang, T. P. Ma, J. W. Golz, B. L. Halpern & J. S. Schmitt from IEEE Electron Device Letters, vol. 13, No. 9, Sept. 1992.
Nuccio, C. and R. N. Schiavone, "Enhancing Semiconductor Reactions", IBM Technical Disclosure Bulletin, vol. 12, No. 9 (Feb. 1970) p. 1433-1434.
Halpern Bret L.
Schmitt Jerome J.
Jet Process Corporation
Owens Terry J.
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