Evaporation supply apparatus for raw material and automatic...

Gas and liquid contact apparatus – With external supply or removal of heat – Temperature or humidity sensor

Reexamination Certificate

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Details

C261S135000, C261S039100, C261S065000, C261S121100

Reexamination Certificate

active

08047510

ABSTRACT:
An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0to regulate the cross-sectional area of the passage through which the mixed gas G0is distributed so as to hold the pressure of the mixed gas G0inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0is supplied to a process chamber while controlling the pressure inside the source tank.

REFERENCES:
patent: 4436674 (1984-03-01), McMenamin
patent: 5288325 (1994-02-01), Gomi
patent: 5336356 (1994-08-01), Ban et al.
patent: 5730423 (1998-03-01), Wu et al.
patent: 5803938 (1998-09-01), Yamaguchi et al.
patent: 2004/0188866 (2004-09-01), Sivaramakrishnan et al.
patent: 0390127 (1989-03-01), None
patent: 0419939 (1991-04-01), None
patent: 60-102251 (1985-07-01), None
patent: 2-255595 (1990-10-01), None
patent: 3-97692 (1991-04-01), None
patent: 3-97693 (1991-04-01), None
patent: 2611008 (1997-02-01), None
patent: 2611009 (1997-02-01), None
patent: 2600383 (1999-08-01), None
patent: 2001-525909 (2001-12-01), None
International Search Report issued in corresponding application PCT/JP2007/000623, completed Sep. 5, 2007 and mailed Sep. 18, 2007.

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