Evaporation method for forming a gas barrier film having an orga

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

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4272552, 427567, C23C 1644

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active

055165559

ABSTRACT:
Films are coated on substrates, useful for applications such as packaging, having a substantially continuous inorganic matrix in which organosilicon moieties are discontinuously dispersed. The inorganic matrix is formed by evaporating an inorganic source within a evacuated chamber while at the same time flowing vaporized organosilicon into the chamber adjacent to an electrically isolated substrate.

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