Coating processes – Coating by vapor – gas – or smoke – Metal coating
Reexamination Certificate
2006-10-24
2006-10-24
Bueker, Richard (Department: 1763)
Coating processes
Coating by vapor, gas, or smoke
Metal coating
C118S726000, C118S730000
Reexamination Certificate
active
07125581
ABSTRACT:
An evaporation method and an apparatus thereof are disclosed. The evaporation apparatus comprises a rotator, a heater and a source supplying device. The rotator, which is disposed above the central portion of the substrate, can rotate the substrate. An evaporation source is disposed on the heater, and the evaporation region is a circular region. The heater and the source supplying device are disposed below the substrate, wherein the source supplying device provides the evaporation source on the heater along a supply direction. In order to prevent the location of the evaporation source shifts along the supply direction from affecting the uniformity of deposited film, a circular trace is defined and the heater is disposed below the circular trace so that the supplying direction is parallel to the tangential direction of the circular trace.
REFERENCES:
patent: 3750623 (1973-08-01), Carpenter et al.
patent: 3797452 (1974-03-01), Dobson
patent: 4222345 (1980-09-01), Bergfelt et al.
patent: 4310614 (1982-01-01), Connell et al.
patent: 4791261 (1988-12-01), Phinney et al.
patent: 5230923 (1993-07-01), Hirokawa et al.
patent: 5622564 (1997-04-01), Vignola et al.
patent: 6280792 (2001-08-01), Tochishita et al.
patent: 6340501 (2002-01-01), Kamiyama et al.
patent: 6475287 (2002-11-01), Clark
patent: 6676990 (2004-01-01), Hatwar et al.
patent: 2003/0010288 (2003-01-01), Yamazaki et al.
patent: 59-133366 (1984-07-01), None
Webster's New World Dictionary of the american Language, The World Publishing Co., 1972, p. 1013.
Chen Chun-An
Tuan Chi-Hsien
Bueker Richard
J.C. Patents
RiTdisplay Corporation
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