Metal treatment – Stock – Cobalt base
Patent
1997-05-22
2000-10-03
Ip, Sikyin
Metal treatment
Stock
Cobalt base
420435, 420436, 148674, C23C 1420
Patent
active
061267600
ABSTRACT:
An evaporation material is used in manufacturing a VTR tape, a vertical magnetic recording thin film or the like. The evaporation material is a wire comprising a cobalt metal a cobalt--nickel alloy containing not more than 30 weight % of nickel, or a cobalt--chromium alloy containing not more than 30 weight % of chromium. This wire has a diameter of at least 1.0 mm and not more than 10 mm, a tensile strength of at least 400 MPa and not more than 1500 MPa, and an elongation and a reduction of area of at least 5%. The evaporation material has a prescribed crystal structure, with a face centered cubic lattice ratio of at least 0.1 and not more than 1. It is possible to obtain a wire having the above properties by heating the metal material to at least Tu.degree. C. and thereafter performing plastic working of reduction in area of at least 10% in a single pass at a temperature of at least Td.degree. C. and not more than (Tu+200).degree. C. Preferably, the cobalt metal or the cobalt--nickel alloy further contains 0.01 to 0.1 weight % of Mn, Cr, Mg, Zr or Ca. Preferably, the cobalt--chromium alloy further contains 0.01 to 0.1 weight % of Mn, Mg, Zr or Ca.
REFERENCES:
patent: 3091022 (1963-05-01), Faulkner
patent: 3563731 (1971-02-01), Cape
patent: 4832810 (1989-05-01), Nakamura et al.
The abstract of CA 893627 is provided in place of DE 1558632.
Diderrich, E; Drapier, J. M.; Coutosouradis, D.; Habraken, L, Low-alloy ductile cobalt for hard facing electrodes, cobalt (Engl. Ed.) (1975), (1), 7-16 (abstract only), 1975.
Diderrich, E; Drapier, J. M.; Coutosouradis, D.; Habraken, L, Low-alloy ductile cobalt for hard facing electrodes, cobalt (Engl. Ed.) (1975), (1), 7-16, 1975.
Kawabe Nozomu
Murai Teruyuki
Oishi Yukihiro
Yamamoto Susumu
Fasse W. F.
Fasse W. G.
Ip Sikyin
Sumitomo Electric Industries Ltd.
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