Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1985-03-22
1986-08-19
Morgenstern, Norman
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
118724, 156DIG103, C23C 1600
Patent
active
046062963
ABSTRACT:
Evaporation cell for a liquid compound suitable for molecular jet epitaxy on a substrate from a compound which is liquid at ambient temperature and which comprises in per se known manner a cell containing said liquid compound in a main ultravacuum enclosure, the cell being provided with heating means. It comprises a preliminary vacuum enclosure tightly connected to the main enclosure and having a first opening provided with a valve and a pipe for forming and regulating the preliminary vacuum in the preliminary vacuum enclosure, an upwardly oriented second opening linked with a chamber containing a large free surface area reservoir for receiving a liquid compound stock, as well as a third downwardly oriented opening linked with a disassemblable reservoir for emptying the liquid compound, while in the preliminary vacuum enclosure is provided a three-way cock connecting the cell containing the liquid compound either to the large surface reservoir, or to the disassemblable reservoir.
REFERENCES:
patent: 2426377 (1947-08-01), Smith, Jr.
patent: 3634647 (1972-01-01), Dale, Jr.
Journal of Crystal Growth vol. 54 (Sep., 1981).
Gailliard Jean P.
Million Alain
Piaquet Jean
Commissariat a l''Energie Atomique
Jaconetty K.
Morgenstern Norman
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