Evaluation method and fabrication method of optical element...

Radiant energy – Radiant energy generation and sources – With radiation modifying member

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000, C355S077000, C353S122000

Reexamination Certificate

active

07858958

ABSTRACT:
A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference.

REFERENCES:
patent: 6355381 (2002-03-01), Yan et al.
patent: 6479195 (2002-11-01), Kirchauer et al.
patent: 6607862 (2003-08-01), Yan et al.
patent: 6610447 (2003-08-01), Yan et al.
patent: 6756163 (2004-06-01), Yan
patent: 7083290 (2006-08-01), Masaki et al.
patent: 7280184 (2007-10-01), Hasegawa et al.
patent: 2002/0044287 (2002-04-01), Otaki
patent: 2003/0081722 (2003-05-01), Kandaka et al.
patent: 2000-55841 (2000-02-01), None
patent: 2000-097620 (2000-04-01), None
patent: 2002-243669 (2002-08-01), None
M. Malinowski et al.; “Controlling Contamination in Mo/Si Multiplayer Mirrors by Si Surface-capping Modifications” , Proceedings of SPIE; vol. 4688; (Jul. 2002); pp. 442-453.
M. Yamamoto; “SUB-nm Figure Error Correction of an EUV Multilayer Mirror by its Surface Milling”; Nuclear Instruments and Method in Physics Research A.; (2001) pp. 1282-1285.
Y. Nakai et al. “Stopping Power of Matter for Electrons Below 10kV”; Applied Physics; vol. 51, Section 3; (Mar. 1982); pp. 279-282; with English translation (8 pages).
J.H. Underwood et al.; “Layered Synthetic Microstructures as Bragg Diffractors for X-rays and Extreme Ultraviolet: Theory and Predicted Performance”; Applied Optics; vol. 20, No. 17; (Sep. 1, 1981); pp. 3027-3034.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Evaluation method and fabrication method of optical element... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Evaluation method and fabrication method of optical element..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Evaluation method and fabrication method of optical element... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4164168

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.