Radiant energy – Radiant energy generation and sources – With radiation modifying member
Reexamination Certificate
2005-05-06
2009-06-09
Vanore, David A. (Department: 2881)
Radiant energy
Radiant energy generation and sources
With radiation modifying member
C430S005000, C355S053000, C355S077000
Reexamination Certificate
active
07544960
ABSTRACT:
A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference.
REFERENCES:
patent: 6355381 (2002-03-01), Yan et al.
patent: 6479195 (2002-11-01), Kirchauer et al.
patent: 6607862 (2003-08-01), Yan et al.
patent: 6610447 (2003-08-01), Yan et al.
patent: 6756163 (2004-06-01), Yan
patent: 6908713 (2005-06-01), Silverman
patent: 7083290 (2006-08-01), Masaki et al.
patent: 7280184 (2007-10-01), Hasegawa et al.
patent: 2002/0044287 (2002-04-01), Otaki
patent: 2003/0081722 (2003-05-01), Kandaka et al.
patent: 2000-55841 (2000-02-01), None
patent: 2000-97620 (2000-04-01), None
patent: 2002-243669 (2002-08-01), None
M. Malinowshi et al.; “Controlling Contamination in Mo/Si Multiplayer Mirrors by Si Surface-capping Modifications”;Proceedings of SPIE; vol. 4688; (Jul. 2002); pp. 442-453.
M. Yamamoto; “SUB-nm Figure Error Corrrection of an EUV multilayer Mirror by its Surface Milling”;Nuclear Instruments and Method in Physics Research A.; (2001); pp. 1282-1285.
Y. Nakai et al.; “Stopping Power of Matter for Electrons Below 10keV”;Applied Physics; vol. 51, Section 3; (Mar. 1982); pp. 279-282 ;with English translation (8 pages).
J. H. Underwood et al.; “Layered Synthetic Microstructures as Bragg Diffractors for X-rays and Extreme Ultraviolet: Theory and Predicted Performance”;Applied Optics; vol. 20, No. 17; (Sep. 1, 1981); pp. 3027-3034.
Miyachi Takeshi
Miyake Akira
Canon Kabushiki Kaisha
Locke Lord Bissell & Liddell LLP
Vanore David A.
LandOfFree
Evaluation method and fabrication method of optical element... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Evaluation method and fabrication method of optical element..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Evaluation method and fabrication method of optical element... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4064621