EUV radiation source with high radiation output based on a...

Details EUV radiation source with high radiation output based on a... EUV radiation source with high radiation output based on a...

2006-08-16

2008-08-19

Nguyen, Kiet T (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

Reexamination Certificate

active

07414253

ABSTRACT:
The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the invention to find a novel possibility for plasma-based radiation generation with high radiation output in the EUV spectral region (between 12 nm and 14 nm) which makes it possible to use tin as a work medium in EUV gas discharge sources for industrial applications. This object is met, according to the invention, in that a gas preparation unit is provided for defined control of the temperature and pressure of a tin-containing work medium and the flow thereof into the vacuum chamber in gaseous state. At least one thermally insulated reservoir vessel and a thermally insulated supply line are provided for transferring the gaseous tin-containing work medium from the gas preparation unit to the pre-ionization unit located inside the electrode housing.

REFERENCES:
patent: 6232613 (2001-05-01), Silfvast et al.
patent: 6389106 (2002-05-01), Neff et al.
patent: 6414438 (2002-07-01), Borisov et al.
patent: 6728337 (2004-04-01), McGeoch
patent: 6894298 (2005-05-01), Ahmad et al.
patent: 102 19 173 (2003-11-01), None
patent: 102 60 458 (2004-07-01), None
patent: 1 460 886 (2004-09-01), None
patent: 03/087867 (2003-10-01), None

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