EUV lithography glass structures formed by extrusion...

Glass manufacturing – Processes – With shaping of particulate material and subsequent fusing...

Reexamination Certificate

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C065S017300, C065S183000, C065S401000

Reexamination Certificate

active

06997015

ABSTRACT:
The invention discloses a method for forming substantially striae-free glass substrates that are suitable for optical applications, including use in forming optical elements or structures such as mirrors and platen stage structures that can be used, for example, in EUV lithography. The method includes forming a mixture of silica soot, binder, lubricant and solvent. The homogenized mixture is then extruded through a slit die or mask into a flat planar pre-form, and the extruded pre-form is then consolidated by heating into a substantially full density, substantially striae-free lithography glass substrate structure. The consolidated perform has a substantially uniform coefficient of thermal expansion and is also substantially void free.

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patent: WO 01/08163 (2001-02-01), None

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