EUV lithography filter

Details EUV lithography filter EUV lithography filter

2007-07-31

2007-07-31

Kim, Robert (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S492200, C250S372000, C250S503100, C378S156000, C378S158000

Reexamination Certificate

active

11039170

ABSTRACT:
Filters for EUV lithography, methods of manufacture thereof, and methods of filtering in an EUV lithography system are disclosed. The filter comprises a nanotube material layer sandwiched by two thin material layers that are highly transmissive and provide structural support for the nanotube material layer. The filter is supported on at least one side by a patterned structural support. The filter mitigates debris, provides spectral purity filtering, or both.

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