EUV lithography apparatus and method for determining the...

Details EUV lithography apparatus and method for determining the... EUV lithography apparatus and method for determining the...

2008-08-21

2011-11-08

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

08054446

ABSTRACT:
The invention relates to an EUV lithography apparatus with at least one EUV-reflective optical surface and a cavity ringdown reflectometer adapted to determine the contamination status of the EUV-reflective optical surface for at least one contaminating substance by determining the reflectivity of the EUV-reflective optical surface for radiation at a measuring wavelength (λm). The invention further relates to a method for determining the contamination status of at least one EUV-reflective optical surface arranged in an EUV lithography apparatus for at least one contaminating substance comprising determining the reflectivity of the EUV-reflective optical surface for radiation at a measuring wavelength (λm) using a cavity ringdown reflectometer.

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“Optical Lossmeters” Los Gatos Research, www.lgrinc.com.

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