EUV LITHOGRAPHIC PROJECTION APPARATUS COMPRISING AN OPTICAL...

Details EUV LITHOGRAPHIC PROJECTION APPARATUS COMPRISING AN OPTICAL... EUV LITHOGRAPHIC PROJECTION APPARATUS COMPRISING AN OPTICAL...

2005-04-19

2005-04-19

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

06882406

ABSTRACT:
An EUV lithographic apparatus contains an optical element, the surface of the optical element being modified to reduce the effects of reflectivity reduction by molecular contamination. The surface is modified such that it includes a self assembled monolayer.

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Abstract No. XP-002238584, “Method for repairing a magnesium fluoride antireflection coating on a lithographic stepper lens surface which has been damaged by exposure to hydrogen chloride gas comprises replacing the coating with an alumina-quartz bilayer coating,”Int. Business Machines Corp., vol. 431, No. 175 (2000).
Klebanoff et al., “Radiation-induced protective carbon coating for extreme ultraviolet optics,”J. Vac. Sci. Technol. B20(2):696-703 (2002), XP-002238582.
Hector et al., “Review of progress in extreme ultraviolet lithography masks,”J. Vac. Sci. Technol. B19(6):2001, XP-002238583.

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