EUV light source collector erosion mitigation

Radiant energy – Means to align or position an object relative to a source or...

Reexamination Certificate

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Details

C250S50400H, C250S503100, C250S50400H, C219S121570, C372S038060, C372S069000, C372S057000

Reexamination Certificate

active

07141806

ABSTRACT:
An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma, is disclosed which may comprise including within an EUV plasma source material a replacement material. The replacement material may comprise the same material as the capping material of the multilayered mirror. The replacement material may comprise a material that is essentially transparent to light in a selected band of EUV light, e.g., a spectrum of EUV light generated in a plasma of a plasma source material. The replacement material may comprise a material not susceptible to being etched by an etching material used to remove deposited plasma source material from the collector, e.g., a halogen etchant.

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