EUV debris mitigation filter and method for fabricating...

Details EUV debris mitigation filter and method for fabricating... EUV debris mitigation filter and method for fabricating...

2007-03-13

2010-02-16

Vanore, David A (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S50400H, C250S492100, C250S492200, C250S493100, C378S119000, C378S034000, C355S030000

Reexamination Certificate

active

07663127

ABSTRACT:
According to one exemplary embodiment, an extreme ultraviolet (EUV) source collector module for use in a lithographic tool comprises an EUV debris mitigation filter. The EUV debris mitigation filter can be in the form of an aerogel film, and can be used in combination with an EUV debris mitigation module comprising a combination of conventional debris mitigation techniques. The EUV debris mitigation filter protects collector optics from contamination by undesirable debris produced during EUV light emission, while advantageously providing a high level of EUV light transmittance. One disclosed embodiment comprises implementation of an EUV debris mitigation filter in an EUV source collector module utilizing a discharge-produced plasma (DPP) light source. One disclosed embodiment comprises implementation of an EUV debris mitigation filter in an EUV source collector module utilizing a laser-produced plasma (LPP) light source.

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