Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...
Reexamination Certificate
2006-04-04
2006-04-04
Dentz, Bernard (Department: 1625)
Organic compounds -- part of the class 532-570 series
Organic compounds
Heterocyclic carbon compounds containing a hetero ring...
C106S287160, C427S070000, C427S578000, C427S585000
Reexamination Certificate
active
07022864
ABSTRACT:
An organosilicon precursor for vapor deposition, e.g., low pressure (<100 Torr), plasma-enhanced chemical vapor deposition (PECVD) of a low k, high strength dielectric film, wherein the precursor includes at least one of:(i) silicon-pendant oxiranyl functionality; and(ii) a disilyl moiety of the formulawherein x is an integer having a value of from 0 to 4 inclusive. These precursors are useful for the formation of dielectric films having dielectric constants on the order of ˜3 and less, and a hardness exceeding ˜1 GigaPascals.
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Baum Thomas H.
Bilodeau Steven
Borovik Alexander S.
Ebbing Abigail
Roeder Jeffrey F.
Advanced Technology & Materials Inc.
Dentz Bernard
Hultquist Steven J.
Intellectual Property / Technology Law
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